We're a European company experienced in innovative growth methods of semiconductor materials.
At Phostec we are primarely focused on the development of high-pressure equipment and technology for the manufacturing of A3B5 phosphide and the development of HT CVD deposition technology (PG, PBN).
Our manufacturing portfolio includes, but isn't limited to the following:
- InP and GaP polycrystalline ingots, both produced by vertical gradient freeze (VGF) methods.
- Pyrolytic Boron Nitride and Pyrolytic Graphite crucibles, PG grids for vacuum tubes.
- Manufacturing of small PBN crucibles for MBE application.
- Custom made graphite parts of various size, deposited with the thin layers of pyrolytic graphite (PG) and pyrolytic boron nitride (PBN), utilizing chemical vapor deposition (CVD) technology.